A First Outlook of Sputtered FeWO₄ Thin Films for Micro-Supercapacitor Electrodes

The next generation of Internet Things devices requires micro-supercapacitors operating at high voltage which is difficult to achieve using symmetrical design. Thus, their fabrication in an asymmetric configuration mandatory. While MnO 2 well-established as positive electrode, the scarcity existing efficient materials able be used negative side drives research towards new promising materials. Since few years, a class oxide materials, named multicationic oxides, were demonstrated attractive solutions bulk electrodes for electrochemical capacitor. Among them, wolframite-type FeWO 4 was proposed interesting electrode material /MnO capacitors. present paper reports first time on successful thin film synthesis such iron-tungstate films by reactive DC magnetron sputtering, deposition method widely semiconductor industry manufacture micro-devices. pseudocapacitive behaviour documented scale preserved level well, and opens-up possibility use generations micro-supercapacitors.